Electron beam evaporation System
Technical index:
Deposit metals: gold, platinum, aluminum, palladium.
Deposition rate: 0.01-10 nm.
Vacuum: 10e-6 Pa.
Deposition temperature: liquid nitrogen to room temperature.
Located: 205, Building M
Vacuum thermal evaporation system
Technical index:
Deposit metals: gold, chromium, germanium, nickel.
Deposition rate: 0.01-10 nm/s.
Vacuum: 10e-5 Pa.
It is used to deposit various metals and make nano-electrodes.
Located: 205, Building M
Vacuum thermal evaporation system
Technical index:
Deposit metals: lead.
Deposition rate: 1-10 nm/s.
Vacuum: 10e-5 Pa.
Deposition temperature: liquid nitrogen to room temperature.
Specially used for the deposition of metallic lead.
Located: 205, Building M