Facilities

Molecular Beam Epitaxy System

Molecular Beam Epitaxy System

Ultimate vacuum of main chamber is 3 × 10-10 mbar.Temperature of sample stage is controlled by PID controller.The system can hold 8 sources. ( 7 port are occupied. 6 Knudsen Cell ( Bi, Se, Te, Sb, Mn, Al ) and 1 E-beam evaporator ( Co ) )Equipped with Quartz Oscillator and RHEED as monitoring system.

Located: 206, Building M

Chemical vapor synthesis and single crystal growth equipment

Chemical vapor synthesis and single crystal growth equipment

Technical index:
Temperature range: room temperature to 1600k.
Tube diameter: 30-60 cm.
Main functions and applications: used to grow two-dimensional materials, nanowires and single crystal samples.

Located: 705, Building M

Atomic force microscope

Atomic force microscope

Technical index: Maximum scanning range: 90 μm × 90 μm × 10 μm.
Noise level in Z direction: < 0.05 nm.
Optical auxiliary system, field of view: 180 um ~ 1465 um.
Maximum size of sample: 150 mm × 15 mm.
Sample table moving range: 150 mm × 150 mm.
Maximum size of sample: 150 mm × 15 mm.
Atomic force microscopy is an analysis instrument that uses the interaction force between atoms and molecules to observe the microscopic morphology of the surface of an object and can be used to study the surface structure of solid materials including insulators. This microscope mainly has contact mode, tap mode and magnetic force microscope mode.

Located: B121, Building M